Valve Self Washing II

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Valve Self-Washing System – II
Application Type
  Washing LC Valve
Application ID
  Valve Self-Washing System – II
Description
  Accessory Showcase

Contents

Main Features

  • Increased Throughput by simultaneous washing of injection syringe and injection valve
  • 4 Wash Solvents can be used to wash the valve
  • 9 Program Steps to wash with the 4 wash solvents in any order
  • Software Interface SDS Launchpad
  • Save/Load Methods
  • Easy Verification of Downloaded Method via the “Dashboard” feature in SDS Launchpad
  • Contact Closure Triggered
  • Runs stored wash routine
  • Washes independent of injection syringe
  • Can increase syringe life
  • Compatible with all PAL Drivers

Performance Specifications

  • Maximum flowrate 6mL/min in increments of 0.1mL/min
  • Flowrate accuracy ± 10%
  • Maximum dispensed volume 999mL
  • Volumetric accuracy ± 5%
  • Maximum pressure 50PSIG
  • Typical wash time for 2 solvents (1mL each) @ 6mL/min is 45 seconds

Requirements/Limitations

  • Through-loop washes only for injection loop volumes > 20uL
  • Lower dispense speeds needed for more viscous solvents, e.g., i-Propanol @ 3-4mL/min
  • Use of Polypropylene compatible solvents

Screenshots

Other Reference material

Comparison of VSW and Active Wash

Autosampler Carryover

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Accessories for the PAL

Other Accessories for PAL Robots


LEAP provides automated workstation instrumentation solutions based on the LEAP CTC PAL X, Y, Z syringe only autosampler robot from LEAP Technologies. This extremely flexible, precise, and adaptable liquid handling robotic platform is available in a variety of lengths and options depending on the requirements of your sample preparation and injections for your UHPLC, LC or GC chromatography.LEAP offers full support and service for the PAL platform in addition to being able to write custom macros, cycles, and scheduling to your applications. Please contact LEAP Technologies on how we can help you get maximized throughput with flexible pipetting automation solutions.

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